Ritomský, A., Benčurová, A., Hluchý, L., Nemec, P., Slížik, P., Andok, R., & Jablonská, V. Voxel-Based Rendering of E-Beam Lithography Processes.
Chicago Style (17th ed.) CitationRitomský, Adrian, Anna Benčurová, Ladislav Hluchý, Pavol Nemec, Peter Slížik, Robert Andok, and Viera Jablonská. Voxel-Based Rendering of E-Beam Lithography Processes.
MLA (9th ed.) CitationRitomský, Adrian, et al. Voxel-Based Rendering of E-Beam Lithography Processes.
Warning: These citations may not always be 100% accurate.


