APA (7th ed.) Citation

Tischler, D., Stepanek, I., & Budinská, Z. Si and Gradient Layer Formed by RF PACVD Technology.

Chicago Style (17th ed.) Citation

Tischler, Daniel, Ivo Stepanek, and Zuzana Budinská. Si and Gradient Layer Formed by RF PACVD Technology.

MLA (9th ed.) Citation

Tischler, Daniel, et al. Si and Gradient Layer Formed by RF PACVD Technology.