Handke, R., Haščík, Š., & Huran, J. Plasma etching of deep Si-trenches with CBrF3 and dilutions.
Chicago Style (17th ed.) CitationHandke, R., Š Haščík, and Jozef Huran. Plasma Etching of Deep Si-trenches with CBrF3 and Dilutions.
MLA (9th ed.) CitationHandke, R., et al. Plasma Etching of Deep Si-trenches with CBrF3 and Dilutions.
Warning: These citations may not always be 100% accurate.
