Plasma etching of deep Si-trenches with CBrF3 and dilutions

Bibliographic Details
Main Authors:	Handke, R. (Author), Haščík, Š. (Author), Huran, Jozef (Author)
Format:	Article
Language:	English
Subjects:	kremík plazmové leptanie články z novín a časopisov

Description
Physical Description:	Obr. 6. Res. angl., rus., lit. 9 zázn. v angl., ruš.

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