Brčka, J., & Harman, R. Reactive ion etching of SiO3N4 in CF4 plasma.
Chicago Style (17th ed.) CitationBrčka, J., and Rudolf Harman. Reactive Ion Etching of SiO3N4 in CF4 Plasma.
MLA (9th ed.) CitationBrčka, J., and Rudolf Harman. Reactive Ion Etching of SiO3N4 in CF4 Plasma.
Warning: These citations may not always be 100% accurate.