Reactive ion etching of SiO3N4 in CF4 plasma

Bibliographic Details
Main Authors:	Brčka, J. (Author), Harman, Rudolf, 1931-1999 (Author)
Format:	Article
Language:	English
Subjects:	plazma (fyzika) iónové leptanie články z novín a časopisov

Description
Physical Description:	Obr. 3. Res. rus., lit. 7 zázn. v slov., ruš., angl.

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