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|a Brčka, J.
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|9 1375055
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|a Reactive ion etching of SiO3N4 in CF4 plasma
|c J. Brčka, R. Harman
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|a Harman, Rudolf,
|d 1931-1999
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|9 37285
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|t Acta physica slovaca
|g Roč. 37, č. 2 (1987), s. 93-97
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