Investigation of e-beam resists for structure patterning in the nanophotonic device fabrication

Bibliographic Details
Main Authors:	Bencurova, A. (Author), Konecnikova, A. (Author), Ritomsky, A. (Author), Kostic, I. (Author), Skriniarova, J. (Author), Glezos, N. (Author), Nemec, P. (Author), Andok, R. (Author), Hascik, S. (Author)
Format:	Article
Language:	English

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