Skip to content
Book Bag:
0
items
(Full)
Login
Language
English
Slovak
Catalog
Catalog Books
Articles
Catalog ONDV
Catalog OND
All Fields
Title
Author
Subject
Call Number
ISBN/ISSN
Find
Advanced
CHARACTERIZATION OF TEST STRUC...
Cite this
Print
Export Record
Export to MARC
Export to BibTeX
Export to Jednoduchý textový výpis
Export to ISBD (text)
Export to Citácia ISO 690 (HTML)
Export to Citácia ISO 690 (.doc)
Add to Book Bag
Remove from Book Bag
Permanent link
CHARACTERIZATION OF TEST STRUCTURES FOR E-BEAM LITHOGRAPHY FOR ESTIMATION OF PROXIMITY EXPOSURE PARAMETERS
Bibliographic Details
Main Authors:
Benčurová, A.
(Author)
,
Konečníková, A.
(Author)
,
Matay, L.
(Author)
,
Nemec, P.
(Author)
,
Andok, R.
(Author)
Format:
Article
Language:
English
Pozri predplatné
Predplatné
Kliknite na „Pozri predplatné“.
Holdings
Description
Similar Items
Staff View
Similar Items
Voxel-Based Rendering of E-Beam Lithography Processes
by: Ritomský, Adrian, et al.
INTERACTION OF ELECTRONS WITH THIN FILMS IN ELECTRON-BEAM LITHOGRAPHY
by: Belov, M., et al.
Photonic structures patterned in AlGaAs/GaAs heterostructures by the EBDW lithography
by: Benčurová, E., et al.
INVESTIGATION OF THE LED WITH PHC PREPARED BY E-BEAM LITHOGRAPHY
by: Kováč, Jaroslav, 1947-, et al.
Investigation of e-beam resists for structure patterning in the nanophotonic device fabrication
by: Bencurova, A., et al.