ELECTRICAL PROPERTIES OF Ru/HfO2/SiO2/Si(n) MOS STRUCTURE

Bibliographic Details
Main Authors:	Donoval, Daniel, 1953- (Author), Breza, Juraj, 1951- (Author), Racko, J. (Author), Harmatha, Ladislav, 1948- (Author), Benko, P. (Author), Pinteš, P. (Author), Valent, P. (Author)
Format:	Article
Language:	English

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