Plasma enhanced chemical vapor deposition of low-k a-SiC:H thin films: FTIR study OF CHEMICAL bonding

Bibliographic Details
Main Authors:	Kobzev, A. P. (Author), Kleinová, A. (Author), Arbet, J. (Author), Huran, J. (Author), Sekáčová, M. (Author), Boháček, P. (Author), Sasinková, V. (Author)
Format:	Article
Language:	English

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