THE AZ 5214E RESIST IN EBDW LITHOGRAPHY AND ITS USE AS A RIE ETCH-MASK IN ETCHING THIN AG LAYERS IN N2 PLASMA

Bibliographic Details
Main Authors:	Benčurová, Anna (Author), Konečníková, Anna (Author), Škriniarová, Jaroslava (Author), Matay, Ladislav (Author), Hrkút, Pavol (Author), Nemec, Pavol (Author), Andok, Robert (Author)
Format:	Article
Language:	English

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