APA (7th ed.) Citation

Benčurová, A., Konečníková, A., Škriniarová, J., Matay, L., Hrkút, P., Nemec, P., & Andok, R. THE AZ 5214E RESIST IN EBDW LITHOGRAPHY AND ITS USE AS A RIE ETCH-MASK IN ETCHING THIN AG LAYERS IN N2 PLASMA.

Chicago Style (17th ed.) Citation

Benčurová, Anna, Anna Konečníková, Jaroslava Škriniarová, Ladislav Matay, Pavol Hrkút, Pavol Nemec, and Robert Andok. THE AZ 5214E RESIST IN EBDW LITHOGRAPHY AND ITS USE AS A RIE ETCH-MASK IN ETCHING THIN AG LAYERS IN N2 PLASMA.

MLA (9th ed.) Citation

Benčurová, Anna, et al. THE AZ 5214E RESIST IN EBDW LITHOGRAPHY AND ITS USE AS A RIE ETCH-MASK IN ETCHING THIN AG LAYERS IN N2 PLASMA.