PATTERNING TECHNIQUES FOR FABRICATION OF SUBMICROMETER STRUCTURES IN PHOTORESIST, III-V SEMICONDUCTORS AND PMMA

Bibliographic Details
Main Authors:	Pudis, D. (Author), Kubicova, I. (Author), Martincek, I. (Author), Novotny, I. (Author), Skriniarova, J. (Author), Suslik, L. (Author)
Format:	Article
Language:	English

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