Pudis, D., Kubicova, I., Martincek, I., Novotny, I., Skriniarova, J., & Suslik, L. PATTERNING TECHNIQUES FOR FABRICATION OF SUBMICROMETER STRUCTURES IN PHOTORESIST, III-V SEMICONDUCTORS AND PMMA.
Chicago Style (17th ed.) CitationPudis, D., I. Kubicova, I. Martincek, I. Novotny, J. Skriniarova, and L. Suslik. PATTERNING TECHNIQUES FOR FABRICATION OF SUBMICROMETER STRUCTURES IN PHOTORESIST, III-V SEMICONDUCTORS AND PMMA.
MLA (9th ed.) CitationPudis, D., et al. PATTERNING TECHNIQUES FOR FABRICATION OF SUBMICROMETER STRUCTURES IN PHOTORESIST, III-V SEMICONDUCTORS AND PMMA.
Warning: These citations may not always be 100% accurate.
