Properties of silicon nitride films prepared by plasma-enhanced chemical vapour deposition of NH3-SiH4-Ar, NH3-SiH4-He and NH3-SiH4-N2 mixtures NH3-SiH4-Ar, NH3-SiH4-He a NH3-SiH4-N2./

Bibliographic Details
Main Authors:	Huran, Jozef (Author), Szulényi, F. (Author), Pisarovičová, E. (Author)
Format:	Article
Language:	English Slovak
Subjects:	nitridy kremíka metóda plazmo-chemického nanášania články z novín a časopisov

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