APA (7th ed.) Citation

Huran, J., Szulényi, F., & Pisarovičová, E. Properties of silicon nitride films prepared by plasma-enhanced chemical vapour deposition of NH3-SiH4-Ar, NH3-SiH4-He and NH3-SiH4-N2 mixtures: NH3-SiH4-Ar, NH3-SiH4-He a NH3-SiH4-N2.

Chicago Style (17th ed.) Citation

Huran, Jozef, F. Szulényi, and E. Pisarovičová. Properties of Silicon Nitride Films Prepared by Plasma-enhanced Chemical Vapour Deposition of NH3-SiH4-Ar, NH3-SiH4-He and NH3-SiH4-N2 Mixtures: NH3-SiH4-Ar, NH3-SiH4-He a NH3-SiH4-N2.

MLA (9th ed.) Citation

Huran, Jozef, et al. Properties of Silicon Nitride Films Prepared by Plasma-enhanced Chemical Vapour Deposition of NH3-SiH4-Ar, NH3-SiH4-He and NH3-SiH4-N2 Mixtures: NH3-SiH4-Ar, NH3-SiH4-He a NH3-SiH4-N2.