Properties of silicon nitride films prepared by plasma-enhanced chemical vapour deposition of NH3-SiH4-Ar, NH3-SiH4-He and NH3-SiH4-N2 mixtures NH3-SiH4-Ar, NH3-SiH4-He a NH3-SiH4-N2./
| Main Authors: | , , |
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| Format: | Article |
| Language: | English Slovak |
| PhysicalDescription: | Obr. 5. Tb. 1. Res. angl., rus., lit. 5 zázn. v angl. |
| Subjects: |
| Physical Description: | Obr. 5. Tb. 1. Res. angl., rus., lit. 5 zázn. v angl. |
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