Defects formation in boron implanted silicon during rapid isothermal annealing
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| PhysicalDescription: | Obr. 8, res. angl., rus., lit. 9 zázn. v angl. |
| ISSN: | 0323-0465 |
| Subjects: |
| Physical Description: | Obr. 8, res. angl., rus., lit. 9 zázn. v angl. |
|---|---|
| ISSN: | 0323-0465 |
