Haščík, Š., Horniaková, A., & Huran, J. Influence of frequency of RF discharge on reactive ion etching of trench structures.
Chicago Style (17th ed.) CitationHaščík, Š, A. Horniaková, and Jozef Huran. Influence of Frequency of RF Discharge on Reactive Ion Etching of Trench Structures.
MLA (9th ed.) CitationHaščík, Š, et al. Influence of Frequency of RF Discharge on Reactive Ion Etching of Trench Structures.
Warning: These citations may not always be 100% accurate.
