Effect of Si wafer dry etching on spectrally resolved emission of CCl4 plasma ; J. Trnovec, P. Lukáč, R. Juráni, L. Lányi

Bibliographic Details
Main Authors:	Trnovec, J. (Author), Lukáč, P. (Author), Juráni, R. (Author), Lányi, L. (Author)
Format:	Article
Language:	English
Subjects:	plazma (fyzika) spektrá emisné kremík články zo zborníkov

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