APA (7th ed.) Citation

Trnovec, J., Lukáč, P., Juráni, R., & Lányi, L. Effect of Si wafer dry etching on spectrally resolved emission of CCl4 plasma ; J. Trnovec, P. Lukáč, R. Juráni, L. Lányi.

Chicago Style (17th ed.) Citation

Trnovec, J., P. Lukáč, R. Juráni, and L. Lányi. Effect of Si Wafer Dry Etching on Spectrally Resolved Emission of CCl4 Plasma ; J. Trnovec, P. Lukáč, R. Juráni, L. Lányi.

MLA (9th ed.) Citation

Trnovec, J., et al. Effect of Si Wafer Dry Etching on Spectrally Resolved Emission of CCl4 Plasma ; J. Trnovec, P. Lukáč, R. Juráni, L. Lányi.