Effect of Si wafer dry etching on spectrally resolved emission of CCl4 plasma ; J. Trnovec, P. Lukáč, R. Juráni, L. Lányi
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Subjects: |
| Physical Description: | Obr. 6. Tb. 4. Res. slov., angl., rus., lit. 26 zázn. v angl., nem., ruš. |
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